The intensity of reflection in between two different medium of propagation can be calculated by using Fresnel’s equation. Light can either be s-polarized, p-polarized or unpolarized. The light radiated by the sun is an unpolarized light. In order to calculate the total reflection of an unpolarized light, we must first solve the reflected light using the Fresnel equation for s and p polarized reflection. For simplification purpose, the derivation of Fresnel’s equation will be written in at the Appendix. For now we will use the derived version of Fresnel’s equation for reflection and transmission of light. For S-Polarized Light For P-Polarized Light
Where: ni = refractive index of medium 1 nt¬ = refractive index of medium 2 θi = angle of incidence θt¬ = angle of transmission Rs = Reflected intensity at S-Polarization Rp = Reflected intensity at P-Polarization
Antireflection Coating
Generation of charge carriers through absorption of photons is the electrical current generating mechanism of solar …show more content…
Antireflection coatings usually have single or multiple layered dielectric thin films deposited at the top of crystalline silicon substrate using various deposition techniques such as Spray Pyrolysis, Plasma Enhanced Chemical Vapor Deposition, Sputtering and many other similar deposition techniques [16, 18]. Various dielectric materials such as SiNx, SiO2, TiO2, ZnS, ZrO2, AlO¬3¬ and HfO¬2 ¬ can be used as antireflection coating in solar cells. The most widely used ARC is Silicon Nitride (SiNx) and its composites using Plasma-Enhanced Chemical Vapor Deposition (PECVD) due to its excellent surface passivation and good anti reflection properties [16]. Silicon and its composites have been dominating the antireflection coating industry due to its reasonable cost and